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A Current Assisted Deposition Method Based on Contact Mode Atomic Force Microscope
Liu ZL(刘增磊); Jiao ND(焦念东); Wang ZD(王志东); Liu LQ(刘连庆)
作者部门机器人学研究室
会议名称2013 IEEE International Conference on Cyber Technology in Automation, Control and Intelligent Systems
会议日期May 26-29, 2013
会议地点Nanjing, China
会议录名称Proceedings of the 2013 IEEE International Conference on Cyber Technology in Automation, Control and Intelligent Systems
出版者IEEE
出版地NEW YORK
2013
页码287-290
收录类别EI ; CPCI(ISTP)
EI收录号20140817353059
WOS记录号WOS:000349825000050
产权排序1
ISBN号978-1-4799-0610-9
关键词Afm Nano Fabrication Deposition Field Emission
摘要This paper introduces a novel AFM deposition method. In contrast to traditional method, the method in this paper has two differences. Firstly in our method AFM works in contact mode. AFM tip presses on substrate slightly in contact mode and it does not need to control AFM tip-substrate separation precisely, which makes AFM deposition easy to carry out. Secondly current is applied to AFM tip to induce deposition instead of voltage. By applying current, uniform nanodots can be fabricated repeatedly. Furthermore, nanolines can be fabricated directly in a single action with the method. The method is potential to be used for soldering nanowires or fabricating nanostructures.
语种英语
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文献类型会议论文
条目标识符http://ir.sia.cn/handle/173321/13892
专题机器人学研究室
通讯作者Liu ZL(刘增磊)
作者单位1.State Key Laboratory of Robotics, Shenyang Institute of Automation, CAS, Shenyang 110016, China
2.University of Chinese Academy of Sciences, Beijing 100049, China
3.Chiba Institute of Technology, Chiba 275-0016, Japan
推荐引用方式
GB/T 7714
Liu ZL,Jiao ND,Wang ZD,et al. A Current Assisted Deposition Method Based on Contact Mode Atomic Force Microscope[C]. NEW YORK:IEEE,2013:287-290.
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