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A Current Assisted Deposition Method Based on Contact Mode Atomic Force Microscope
Liu ZL(刘增磊); Jiao ND(焦念东); Wang ZD(王志东); Liu LQ(刘连庆)
Department机器人学研究室
Conference Name2013 IEEE International Conference on Cyber Technology in Automation, Control and Intelligent Systems
Conference DateMay 26-29, 2013
Conference PlaceNanjing, China
Source PublicationProceedings of the 2013 IEEE International Conference on Cyber Technology in Automation, Control and Intelligent Systems
PublisherIEEE
Publication PlaceNEW YORK
2013
Pages287-290
Indexed ByEI ; CPCI(ISTP)
EI Accession number20140817353059
WOS IDWOS:000349825000050
Contribution Rank1
ISBN978-1-4799-0610-9
KeywordAfm Nano Fabrication Deposition Field Emission
AbstractThis paper introduces a novel AFM deposition method. In contrast to traditional method, the method in this paper has two differences. Firstly in our method AFM works in contact mode. AFM tip presses on substrate slightly in contact mode and it does not need to control AFM tip-substrate separation precisely, which makes AFM deposition easy to carry out. Secondly current is applied to AFM tip to induce deposition instead of voltage. By applying current, uniform nanodots can be fabricated repeatedly. Furthermore, nanolines can be fabricated directly in a single action with the method. The method is potential to be used for soldering nanowires or fabricating nanostructures.
Language英语
Citation statistics
Document Type会议论文
Identifierhttp://ir.sia.cn/handle/173321/13892
Collection机器人学研究室
Corresponding AuthorLiu ZL(刘增磊)
Affiliation1.State Key Laboratory of Robotics, Shenyang Institute of Automation, CAS, Shenyang 110016, China
2.University of Chinese Academy of Sciences, Beijing 100049, China
3.Chiba Institute of Technology, Chiba 275-0016, Japan
Recommended Citation
GB/T 7714
Liu ZL,Jiao ND,Wang ZD,et al. A Current Assisted Deposition Method Based on Contact Mode Atomic Force Microscope[C]. NEW YORK:IEEE,2013:287-290.
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