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Alternative TitleMethod for achieving atomic force microscope (AFM) nano deposition by applying current
焦念东; 刘增磊; 刘连庆
Rights Holder中国科学院沈阳自动化研究所
Patent Agent沈阳科苑专利商标代理有限公司 21002
Other AbstractThe invention discloses a method for achieving atomic force microscope (AFM) nano deposition by applying a current. According to the method, by means of application of the certain current onto an AFM pinpoint and substrate and control of the magnitude of the current, atoms on an AFM conducting probe are deposited on the substrate to form a conductor deposition point, and the conductor deposition point can be used for processing a nano lattice structure and welding nano materials in a nano device. By means of the method for achieving AFM nano deposition by applying the current, the deposition point with good repeatability and high precision can be processed, and meanwhile, the size of the deposition point can be flexibly controlled; the method can be used for processing nanowires.
PCT Attributes
Application Date2012-12-19
Application NumberCN201210555839.2
Open (Notice) NumberCN103879955A
Contribution Rank1
Document Type专利
Recommended Citation
GB/T 7714
焦念东,刘增磊,刘连庆. 通过施加电流实现原子力显微镜纳米沉积的方法[P]. 2014-06-25.
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