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通过施加电流实现原子力显微镜纳米沉积的方法
Alternative TitleMethod for achieving atomic force microscope (AFM) nano deposition by applying current
焦念东; 刘增磊; 刘连庆
Department机器人学研究室
Rights Holder中国科学院沈阳自动化研究所
Patent Agent沈阳科苑专利商标代理有限公司 21002
Country中国
Subtype发明
Status驳回
Abstract本发明公开一种通过施加电流实现原子力显微镜(AFM)纳米沉积的方法,即通过向AFM针尖和基底施加一定电流并控制电流的大小,实现AFM导电探针上的原子沉积到基底上,形成导体沉积点,该沉积点可用于纳米点阵结构的加工及纳米器件中对纳米材料的焊接。本发明不但可以加工出重复性好、精度高的沉积点,而且可以灵活的控制沉积点的大小。并且本发明的方法还可以用来加工纳米线。
Other AbstractThe invention discloses a method for achieving atomic force microscope (AFM) nano deposition by applying a current. According to the method, by means of application of the certain current onto an AFM pinpoint and substrate and control of the magnitude of the current, atoms on an AFM conducting probe are deposited on the substrate to form a conductor deposition point, and the conductor deposition point can be used for processing a nano lattice structure and welding nano materials in a nano device. By means of the method for achieving AFM nano deposition by applying the current, the deposition point with good repeatability and high precision can be processed, and meanwhile, the size of the deposition point can be flexibly controlled; the method can be used for processing nanowires.
PCT Attributes
Application Date2012-12-19
2014-06-25
Application NumberCN201210555839.2
Open (Notice) NumberCN103879955A
Language中文
Contribution Rank1
Document Type专利
Identifierhttp://ir.sia.cn/handle/173321/15015
Collection机器人学研究室
Affiliation中国科学院沈阳自动化研究所
Recommended Citation
GB/T 7714
焦念东,刘增磊,刘连庆. 通过施加电流实现原子力显微镜纳米沉积的方法[P]. 2014-06-25.
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