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Optically-controlled digital electrodeposition of thin-film metals for fabrication of nano-devices
Liu N(刘娜); Wei FN(魏发南); Liu LQ(刘连庆); Lai, Hok Sum Sam; Yu HB(于海波); Wang YC(王越超); Lee, Gwo-Bin; Li WJ(李文荣)
Department机器人学研究室
Source PublicationOPTICAL MATERIALS EXPRESS
ISSN2159-3930
2015
Volume5Issue:4Pages:838-848
Indexed BySCI ; EI
EI Accession number20152000846895
WOS IDWOS:000352293100019
Contribution Rank1
Funding OrganizationNational Natural Science Foundation of China [61302003] ; NSFC/RGC Joint Research Scheme [5141101088] ; CAS-Croucher Funding Scheme for Joint Laboratories [9500011] ; CAS-FEA International Partnership Program for Creative Research Teams
AbstractPrecise micro-scale patterning of metal thin-films with semiconductor materials is a critical step in the fabrication of any micro-devices. Conventional metal patterning methods such as photolithography, laser-induced direct printing techniques, and micro-contact printing methods all have different disadvantages such as high capital equipment cost and low throughput efficiency. In this article, an optically-controlled digital electrodeposition (ODE) method for direct patterning of metal thin-films on a semiconductor substrate has been demonstrated. This method allows for dynamic patterning of custom micro-scale silver structures with high conductivity of 2 x 10(7) S/m in large scale within 10 seconds and could reach a smallest line width of 2.7 mu m. The entire process is performed at room temperature and atmospheric pressure conditions, while requiring no photolithographic steps or metal nanoparticle inks. Utilizing this direct structural formation technique, a bottom-up protocol for rapidly assembling nanowire-based field-effect transistors has been demonstrated, which shows that this novel technique could potentially become an alternative, low-cost and flexible technology for fabricating integrated nano-devices. (C) 2015 Optical Society of America
Language英语
WOS HeadingsScience & Technology ; Technology ; Physical Sciences
WOS SubjectMaterials Science, Multidisciplinary ; Optics
WOS KeywordFEMTOSECOND LASER ; AG NANOPARTICLES ; DEPOSITION ; COPPER ; STEP
WOS Research AreaMaterials Science ; Optics
Citation statistics
Cited Times:7[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.sia.cn/handle/173321/16231
Collection机器人学研究室
Corresponding AuthorLiu N(刘娜)
Affiliation1.State Key Laboratory of Robotics, Shenyang Institute of Automation, Chinese Academy of Sciences, Shenyang 110016, China
2.University of Chinese Academy of Sciences, Beijing 100049, China
3.Department of Mechanical and Biomedical Engineering, City University of Hong Kong, Kowloon, Hong Kong
4.Department of Power Mechanical Engineering, National Tsing Hua University, Taiwan
Recommended Citation
GB/T 7714
Liu N,Wei FN,Liu LQ,et al. Optically-controlled digital electrodeposition of thin-film metals for fabrication of nano-devices[J]. OPTICAL MATERIALS EXPRESS,2015,5(4):838-848.
APA Liu N.,Wei FN.,Liu LQ.,Lai, Hok Sum Sam.,Yu HB.,...&Li WJ.(2015).Optically-controlled digital electrodeposition of thin-film metals for fabrication of nano-devices.OPTICAL MATERIALS EXPRESS,5(4),838-848.
MLA Liu N,et al."Optically-controlled digital electrodeposition of thin-film metals for fabrication of nano-devices".OPTICAL MATERIALS EXPRESS 5.4(2015):838-848.
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