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ZnSe-material phase mask applied to athermalization of infrared imaging systems
Feng B(冯斌); Shi ZL(史泽林); Xu BS(徐保树); Zhang CS(张程硕); Zhang, Xiaodong
作者部门光电信息技术研究室
发表期刊Applied Optics
ISSN1559-128X
2016
卷号55期号:21页码:5715-5720
收录类别SCI ; EI
EI收录号20163102671131
WOS记录号WOS:000380741100036
产权排序1
资助机构Chinese Academy of Sciences (CAS) (CXJJ-14-S116) ; National Natural Science Foundation of China (NSFC) (51375337)
摘要This paper reports a ZnSe-material phase mask that is applied to athermalization of a conventional infrared imaging system. Its principle, design, manufacture, measurement, and performance validation are successively discussed. This paper concludes that a ZnSe-material phase mask has a permissible manufacturing error 2.14 times as large as a Ge-material phase mask. By constructing and solving an optimization problem, the ZnSe-material phase mask is optimally designed. The optimal phase mask is manufactured and measured with a form manufacturing error of 1.370 μm and a surface roughness value of 9.926 nm. Experiments prove that the wavefront coding athermalized longwave infrared (LWIR) imaging system works well over the temperature range from -40°C to +60°C.
语种英语
WOS标题词Science & Technology ; Physical Sciences
WOS类目Optics
关键词[WOS]ION-IMPLANTATION ; LENS
WOS研究方向Optics
引用统计
被引频次:2[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.sia.cn/handle/173321/18836
专题光电信息技术研究室
通讯作者Feng B(冯斌)
作者单位1.School of Optoelectronic Engineering, Xi'an Technological University, Xi'an, 710032, China
2.Shenyang Institute of Automation, Chinese Academy of Sciences, Shenyang 110016, China
3.Key Laboratory of Opto-electronic Information Processing, Chinese Academy of Sciences, Shenyang 110016, China
4.State Key Laboratory of Precision Measuring Technology and Instruments, Centre of MicroNano Manufacturing Technology, Tianjin University, Tianjin, 300072, China
推荐引用方式
GB/T 7714
Feng B,Shi ZL,Xu BS,et al. ZnSe-material phase mask applied to athermalization of infrared imaging systems[J]. Applied Optics,2016,55(21):5715-5720.
APA Feng B,Shi ZL,Xu BS,Zhang CS,&Zhang, Xiaodong.(2016).ZnSe-material phase mask applied to athermalization of infrared imaging systems.Applied Optics,55(21),5715-5720.
MLA Feng B,et al."ZnSe-material phase mask applied to athermalization of infrared imaging systems".Applied Optics 55.21(2016):5715-5720.
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