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ZnSe-material phase mask applied to athermalization of infrared imaging systems
Feng B(冯斌); Shi ZL(史泽林); Xu BS(徐保树); Zhang CS(张程硕); Zhang, Xiaodong
Department光电信息技术研究室
Source PublicationApplied Optics
ISSN1559-128X
2016
Volume55Issue:21Pages:5715-5720
Indexed BySCI ; EI
EI Accession number20163102671131
WOS IDWOS:000380741100036
Contribution Rank1
Funding OrganizationChinese Academy of Sciences (CAS) (CXJJ-14-S116) ; National Natural Science Foundation of China (NSFC) (51375337)
AbstractThis paper reports a ZnSe-material phase mask that is applied to athermalization of a conventional infrared imaging system. Its principle, design, manufacture, measurement, and performance validation are successively discussed. This paper concludes that a ZnSe-material phase mask has a permissible manufacturing error 2.14 times as large as a Ge-material phase mask. By constructing and solving an optimization problem, the ZnSe-material phase mask is optimally designed. The optimal phase mask is manufactured and measured with a form manufacturing error of 1.370 μm and a surface roughness value of 9.926 nm. Experiments prove that the wavefront coding athermalized longwave infrared (LWIR) imaging system works well over the temperature range from -40°C to +60°C.
Language英语
WOS HeadingsScience & Technology ; Physical Sciences
WOS SubjectOptics
WOS KeywordION-IMPLANTATION ; LENS
WOS Research AreaOptics
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Document Type期刊论文
Identifierhttp://ir.sia.cn/handle/173321/18836
Collection光电信息技术研究室
Corresponding AuthorFeng B(冯斌)
Affiliation1.School of Optoelectronic Engineering, Xi'an Technological University, Xi'an, 710032, China
2.Shenyang Institute of Automation, Chinese Academy of Sciences, Shenyang 110016, China
3.Key Laboratory of Opto-electronic Information Processing, Chinese Academy of Sciences, Shenyang 110016, China
4.State Key Laboratory of Precision Measuring Technology and Instruments, Centre of MicroNano Manufacturing Technology, Tianjin University, Tianjin, 300072, China
Recommended Citation
GB/T 7714
Feng B,Shi ZL,Xu BS,et al. ZnSe-material phase mask applied to athermalization of infrared imaging systems[J]. Applied Optics,2016,55(21):5715-5720.
APA Feng B,Shi ZL,Xu BS,Zhang CS,&Zhang, Xiaodong.(2016).ZnSe-material phase mask applied to athermalization of infrared imaging systems.Applied Optics,55(21),5715-5720.
MLA Feng B,et al."ZnSe-material phase mask applied to athermalization of infrared imaging systems".Applied Optics 55.21(2016):5715-5720.
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