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Compensation of drift contamination in AFM image by local scan
Wang, Yucai; Li GY(李广勇); Xi N(席宁); Liu LQ(刘连庆)
作者部门机器人学研究室
会议名称IEEE International Conference on Robotics and Biomimetics (ROBIO)
会议日期February 22-25, 2009
会议地点Bangkok, Thailand
会议主办者IEEE Robot & Automat Soc
会议录名称2008 IEEE INTERNATIONAL CONFERENCE ON ROBOTICS AND BIOMIMETICS, VOLS 1-4
出版者IEEE
出版地NEW YORK
2009
页码487-492
收录类别EI ; CPCI(ISTP)
EI收录号20093912336517
WOS记录号WOS:000271966900082
产权排序3
ISBN号978-1-4244-2678-2
关键词Nanomanipulation Atomic Force Microscope Drift Compensation
摘要Thermal drift in atomic force microscopy (AFM) is one of the major hurdles to achieve accurate and efficient AFM based nanomanipulation. AFM images are all contaminated by the thermal drift which often leads to failed manipulation operations. In this paper, a local scan strategy is applied to identify the thermal drift contamination in the AFM image and then the draft contamination is compensated. After an AFM image is captured, the entire image is divided into several strips along y direction. A local scan is immediately performed in each part of the image to determine the drift at that portion. In this manner, the drift value is calculated in a small local area instead of the global image. Thus, the drift can be more precisely estimated and the image can be more accurately recovered, and thus leading to improved accuracy of AFM image and enhanced efficiency in AFM based nanomanipulation.
语种英语
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文献类型会议论文
条目标识符http://ir.sia.cn/handle/173321/20031
专题机器人学研究室
通讯作者Wang, Yucai
作者单位1.Department of Electrical and Computer Engineering, University of Pittsburgh, Pittsburgh, PA 15261, United States
2.Department of Electrical and Computer Engineering, Michigan State University, East Lansing, MI 48824, United States
3.State Key Laboratory of Robotics, Shenyang Institute of Automation, Shenyang, Liaoning Province 110016, China
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GB/T 7714
Wang, Yucai,Li GY,Xi N,et al. Compensation of drift contamination in AFM image by local scan[C]//IEEE Robot & Automat Soc. NEW YORK:IEEE,2009:487-492.
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