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Compensation of drift contamination in AFM image by local scan
Wang, Yucai; Li GY(李广勇); Xi N(席宁); Liu LQ(刘连庆)
Conference NameIEEE International Conference on Robotics and Biomimetics (ROBIO)
Conference DateFebruary 22-25, 2009
Conference PlaceBangkok, Thailand
Author of SourceIEEE Robot & Automat Soc
Publication PlaceNEW YORK
Indexed ByEI ; CPCI(ISTP)
EI Accession number20093912336517
WOS IDWOS:000271966900082
Contribution Rank3
KeywordNanomanipulation Atomic Force Microscope Drift Compensation
AbstractThermal drift in atomic force microscopy (AFM) is one of the major hurdles to achieve accurate and efficient AFM based nanomanipulation. AFM images are all contaminated by the thermal drift which often leads to failed manipulation operations. In this paper, a local scan strategy is applied to identify the thermal drift contamination in the AFM image and then the draft contamination is compensated. After an AFM image is captured, the entire image is divided into several strips along y direction. A local scan is immediately performed in each part of the image to determine the drift at that portion. In this manner, the drift value is calculated in a small local area instead of the global image. Thus, the drift can be more precisely estimated and the image can be more accurately recovered, and thus leading to improved accuracy of AFM image and enhanced efficiency in AFM based nanomanipulation.
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Document Type会议论文
Corresponding AuthorWang, Yucai
Affiliation1.Department of Electrical and Computer Engineering, University of Pittsburgh, Pittsburgh, PA 15261, United States
2.Department of Electrical and Computer Engineering, Michigan State University, East Lansing, MI 48824, United States
3.State Key Laboratory of Robotics, Shenyang Institute of Automation, Shenyang, Liaoning Province 110016, China
Recommended Citation
GB/T 7714
Wang, Yucai,Li GY,Xi N,et al. Compensation of drift contamination in AFM image by local scan[C]//IEEE Robot & Automat Soc. NEW YORK:IEEE,2009:487-492.
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