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Phase shifting-based debris effect detection in USV-assisted AFM nanomachining
Shi JL(施佳林); Liu LQ(刘连庆); Yu P(于鹏); Cong Y(丛杨); Li GY(李广勇)
Source PublicationApplied Surface Science
Indexed BySCI ; EI
EI Accession number20171603578233
WOS IDWOS:000401680200037
Contribution Rank1
Funding OrganizationNational Natural Science Foun-dation of China [grant numbers 61522312, 61433017] and the CAS FEA International Partnership Program for Creative Research Teams.
KeywordAtomic Force Microscopy (Afm) Nanomachining Ultrasonic Vibration Thin-film
AbstractAtomic force microscopy (AFM) mechanical-based lithography attracts much attention in nanomanufacturing due to its advantages of low cost, high precision and high resolution. However, debris effects during mechanical lithography often lead to an unstable machining process and inaccurate results, which limits further applications of AFM-based lithography. There is a lack of a real-time debris detection approach, which is the prerequisite to eventually eliminating the influence of the debris, and of a method that can solve the above problems well. The ultrasonic vibration (USV)-assisted AFM has the ability to sense the machining depth in real time by detecting the phase shifting of cantilever. However, whether the pile-up of debris affect the phase response of cantilever is still lack of investigation. Therefore, we analyzed the mechanism of the debris effect on force control mode and investigated the relationship between phase shifting and pile-up of debris. Theoretical analysis and experimental results reveal that the pile-up of debris have negligible effect on phase shifting of cantilever. Therefore, the phase shifting-based method can detect the debris effect on machining depth in force control mode of AFM machining.
WOS HeadingsScience & Technology ; Physical Sciences ; Technology
WOS SubjectChemistry, Physical ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter
WOS Research AreaChemistry ; Materials Science ; Physics
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Cited Times:2[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Corresponding AuthorLiu LQ(刘连庆)
Affiliation1.State Key Laboratory of Robotics, Shenyang Institute of Automation, Chinese Academy of Sciences (CAS), Shenyang, Liaoning, 110016, China
2.University of the Chinese Academy of Sciences, Beijing 100049, China
3.Beijing Advanced Innovation Center for Imaging Technology, Capital Normal University, Beijing 100049, China
4.Department of Electrical and Computer Engineering, University of Pittsburgh, Pittsburgh, PA, 15213, United States
Recommended Citation
GB/T 7714
Shi JL,Liu LQ,Yu P,et al. Phase shifting-based debris effect detection in USV-assisted AFM nanomachining[J]. Applied Surface Science,2017,413:317-326.
APA Shi JL,Liu LQ,Yu P,Cong Y,&Li GY.(2017).Phase shifting-based debris effect detection in USV-assisted AFM nanomachining.Applied Surface Science,413,317-326.
MLA Shi JL,et al."Phase shifting-based debris effect detection in USV-assisted AFM nanomachining".Applied Surface Science 413(2017):317-326.
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