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Modeling Industry 4.0 Demonstration Production Line Using Ptolemy II
Nie ZB(聂振邦)1,2; Wang P(王鹏)1,2; Zeng P(曾鹏)1,2; YU HB(于海斌)1,2
作者部门工业控制网络与系统研究室
会议名称IECON 2017: 43rd Annual Conference of the IEEE Industrial Electronics Society (IES)
会议日期October 29 - November 1, 2017
会议地点Beijing, China
会议主办者IEEE Industrial Electronics Society
会议录名称Proceedings of the 43rd Annual Conference of the IEEE Industrial Electronics Society (IECON 2017)
出版者IEEE
出版地New York
2017
页码5471-5476
收录类别EI ; CPCI(ISTP)
EI收录号20182005193297
WOS记录号WOS:000427164805066
产权排序1
ISSN号1553-572X
ISBN号978-1-5386-1127-2
关键词Industry 4.0 Intelligent Manufacturing Systems Simulation Ptolemy Ii Smart Factory
摘要

The connection of business processes along the value chain and the integration of the production system with business process are two cornerstones of Industry 4.0. The Industry 4.0 Demonstration Production Line (DPL) located at Shenyang Institute of Automation (Shenyang) is a prototype smart factory that implements end-to-end customized production. It is also a testbed for intelligent manufacturing research. Modeling and simulation provide researcher with good insights into the real manufacturing system and help exploring and evaluating new manufacturing control methods. Ptolemy II, a platform that support heterogeneous modeling and simulation, was used to model the Demonstration Production Line. This paper discusses about the main concerns of the modeling problem and presents the modeling process in detail. Simulation result shows that the model can be used for controller logic verification and throughput estimation.

语种英语
引用统计
被引频次:1[WOS]   [WOS记录]     [WOS相关记录]
文献类型会议论文
条目标识符http://ir.sia.cn/handle/173321/22068
专题工业控制网络与系统研究室
通讯作者Nie ZB(聂振邦)
作者单位1.Lab. of Networked Control Systems, Shenyang Institute of Automation, Chinese Academy of Sciences, China;
2.University of Chinese Academy of Sciences, China
推荐引用方式
GB/T 7714
Nie ZB,Wang P,Zeng P,et al. Modeling Industry 4.0 Demonstration Production Line Using Ptolemy II[C]//IEEE Industrial Electronics Society. New York:IEEE,2017:5471-5476.
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