SIA OpenIR  > 机器人学研究室
Fabrication of Sub-Micrometer-Sized MoS2 Thin-Film Transistor by Phase Mode AFM Lithography
Liu LQ(刘连庆)1; Shi JL(施佳林)1; Li M(李萌)1,2; Yu P(于鹏)1; Yang T(杨铁)1; Li GY(李广勇)3
作者部门机器人学研究室
关键词AFM lithography MoS2 TFT fabrication
发表期刊Small
ISSN1613-6810
2018
页码1-6
收录类别EI
EI收录号20183905857415
产权排序1
资助机构National Natural Science Foundation of China (Project Codes: 61522312, 61433017, U1613220) and the CAS FEA International Partnership Program for Creative Research Teams
摘要The phase mode atomic force microscopy (AFM) lithography and monolayer lift-off process are combined to fabricate electronics based on 2D materials (2DMs), which remove the need for pre-fabricating markers and increase the accuracy of the overlay and alignment. The promising phase mode of AFM lithography eliminates the drawbacks of the conventional force mode such as the over-cut, under-cut, debris effect, and severe tip wear. The planar size of MoS2 thin-film transistors is shrunken down to sub-micrometer by the proposed method, and the fabricated devices demonstrate n-type characteristics. It offers a more flexible and easier way to fabricate prototypes of sub-micrometer-sized 2DMs based devices, and gives the opportunity to explore the size effect on the performance of 2DMs devices.
语种英语
文献类型期刊论文
条目标识符http://ir.sia.cn/handle/173321/22818
专题机器人学研究室
通讯作者Liu LQ(刘连庆)
作者单位1.State Key Laboratory of Robotics, Shenyang Institute of Automation, Chinese Academy of Science, Shenyang 110016, China
2.University of Chinese Academy of Science, Beijing 100049, China
3.Department of Electrical and Computer Engineering, University of Pittsburgh, Pittsburgh, PA
4.15213, United States
推荐引用方式
GB/T 7714
Liu LQ,Shi JL,Li M,et al. Fabrication of Sub-Micrometer-Sized MoS2 Thin-Film Transistor by Phase Mode AFM Lithography[J]. Small,2018:1-6.
APA Liu LQ,Shi JL,Li M,Yu P,Yang T,&Li GY.(2018).Fabrication of Sub-Micrometer-Sized MoS2 Thin-Film Transistor by Phase Mode AFM Lithography.Small,1-6.
MLA Liu LQ,et al."Fabrication of Sub-Micrometer-Sized MoS2 Thin-Film Transistor by Phase Mode AFM Lithography".Small (2018):1-6.
条目包含的文件 下载所有文件
文件名称/大小 文献类型 版本类型 开放类型 使用许可
Fabrication of Sub-M(1857KB)期刊论文出版稿开放获取CC BY-NC-SA浏览 下载
个性服务
推荐该条目
保存到收藏夹
查看访问统计
导出为Endnote文件
谷歌学术
谷歌学术中相似的文章
[Liu LQ(刘连庆)]的文章
[Shi JL(施佳林)]的文章
[Li M(李萌)]的文章
百度学术
百度学术中相似的文章
[Liu LQ(刘连庆)]的文章
[Shi JL(施佳林)]的文章
[Li M(李萌)]的文章
必应学术
必应学术中相似的文章
[Liu LQ(刘连庆)]的文章
[Shi JL(施佳林)]的文章
[Li M(李萌)]的文章
相关权益政策
暂无数据
收藏/分享
文件名: Fabrication of Sub-Micrometer-Sized MoS2 Thin-Film Transistor by Phase Mode AFM Lithography.pdf
格式: Adobe PDF
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。