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Photonic Nanojet Sub-Diffraction Nano-Fabrication With in situ Super-Resolution Imaging
Wen YD(文扬东)1,2; Yu HB(于海波)1; Zhao WX(赵文秀)1,2; Wang FF(王飞飞)3; Wang XD(王晓朵)1; Liu LQ(刘连庆)1; Li WJ(李文荣)1,4
Department机器人学研究室
Source PublicationIEEE TRANSACTIONS ON NANOTECHNOLOGY
ISSN1536-125X
2019
Volume18Pages:226-233
Indexed BySCI ; EI
EI Accession number20191006580752
WOS IDWOS:000459538800001
Contribution Rank1
Funding OrganizationNational Natural Science Foundation of China ; NSFC/RGC Joint Research Scheme ; Hong Kong Research Grants Council ; CAS FEA International Partnership Program for Creative Research Teams ; Youth Innovation Promotion Association CAS ; Beijing Advanced Innovation Center for Intelligent Robots and Systems, Beijing Institute of Technology
KeywordPhotonic Nanojet nano-scale processing laser processing super-resolution imaging
AbstractIn this paper, we report a system that uses a microsphere to induce a photonic nanojet to directly write on a sample surface with sub-diffraction limit resolution, while simultaneously observing the writing processing in situ. Because of diffraction limit, sub-wavelength laser processing resolution has been difficult to achieve. Recently, we have shown that a microsphere-induced photonics nanojet could be used to create an optical light spot size beyond the diffraction limits, i.e., the diameter of the light spot could be reduced to -200 nm or smaller. This capability could allow a laser (with significant reduction in input power) to pattern nano-scale structures on various substrate materials through the use of microspheres. Many researchers have attempted to use this photonic nanojet (PNJ) based technique to process sub-diffraction limit patterns on all types of materials. However, applying this method to process features at precise locations is very difficult, because the technique requires that a sample being "cut" by the PNJ be observed by a common optical microscope, which cannot resolve features smaller than the optical diffraction limit. This disadvantage limits the applicability of this novel method to nanoscale processing; for example, in trimming resistors in an integrated circuit chip, many circuit components on the chip are much smaller than 200 nm, and not being able to see features beyond the diffraction limit will inadvertently destroy many components while PNJ is used to trim resistive elements. We will show in this paper that processing resolution better than 200 nm is achievable using our laser-based photonic nanojet method, whereas a simultaneous imaging resolution of less than lambda/2 could be obtained. Therefore, the method presented in this paper has potential applications in processing sub-diffraction features and bio-specimens in real time with optical information feedback.
Language英语
WOS SubjectEngineering, Electrical & Electronic ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied
WOS KeywordFEMTOSECOND LASER ; MICROSCOPY ; NANOFABRICATION ; NANOPARTICLES ; LIGHT ; FIELD
WOS Research AreaEngineering ; Science & Technology - Other Topics ; Materials Science ; Physics
Funding ProjectNational Natural Science Foundation of China[61433017] ; National Natural Science Foundation of China[61503258] ; National Natural Science Foundation of China[61727811] ; National Natural Science Foundation of China[61803323] ; NSFC/RGC Joint Research Scheme[51461165501] ; NSFC/RGC Joint Research Scheme[N_CityU132/14] ; Hong Kong Research Grants Council[11205415] ; CAS FEA International Partnership Program for Creative Research Teams ; Youth Innovation Promotion Association CAS ; Beijing Advanced Innovation Center for Intelligent Robots and Systems, Beijing Institute of Technology[2016IRS08]
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Document Type期刊论文
Identifierhttp://ir.sia.cn/handle/173321/24252
Collection机器人学研究室
Corresponding AuthorLiu LQ(刘连庆); Li WJ(李文荣)
Affiliation1.State Key Laboratory of Robotics, Shenyang Institute of Automation, Chinese Academy of Sciences, Shenyang 110016, China
2.University of Chinese Academy of Sciences, Beijing 100049, China
3.e Department of Chemistry, Stanford University, Stanford, CA 94305 USA
4.e Department of Mechanical Engineering, City University of Hong Kong, Kowloon Tong, Hong Kong
Recommended Citation
GB/T 7714
Wen YD,Yu HB,Zhao WX,et al. Photonic Nanojet Sub-Diffraction Nano-Fabrication With in situ Super-Resolution Imaging[J]. IEEE TRANSACTIONS ON NANOTECHNOLOGY,2019,18:226-233.
APA Wen YD.,Yu HB.,Zhao WX.,Wang FF.,Wang XD.,...&Li WJ.(2019).Photonic Nanojet Sub-Diffraction Nano-Fabrication With in situ Super-Resolution Imaging.IEEE TRANSACTIONS ON NANOTECHNOLOGY,18,226-233.
MLA Wen YD,et al."Photonic Nanojet Sub-Diffraction Nano-Fabrication With in situ Super-Resolution Imaging".IEEE TRANSACTIONS ON NANOTECHNOLOGY 18(2019):226-233.
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