SIA OpenIR  > 工业信息学研究室  > 工业控制系统研究室
半导体设备控制中SEMI标准模型研究
刘明哲; 徐皑冬; 于海斌
Department工业控制系统研究室
Source Publication仪器仪表学报
ISSN0254-3087
2008
Volume29Issue:SPages:687-690
Contribution Rank1
Keyword集成电路 电路制造 电路工艺 半导体设备
Abstract半导体集成电路的生产制造向300mm晶圆的方向发展,对半导体设备的工艺控制、物料传输,设备管理和生产调度都有着更进一步的需求。本文通过分析了半导体制造流程和控制要求,综述了半导体设备控制中的SEMI标准模型,并探讨了这一领域进一步研究的发展方向。
Other AbstractWith the development of road to 300mm semiconductor wafer manufacturing,There is a farther requirement of process control,material transfer,equipment management and production scheduling in IC equipment.This paper analyses the semiconductor manufacturing process and control requirement,describes SEMI standard model of IC equipment,and discusses further research in this field.
Language中文
Document Type期刊论文
Identifierhttp://ir.sia.cn/handle/173321/4874
Collection工业信息学研究室_工业控制系统研究室
Corresponding Author刘明哲
Affiliation中国科学院沈阳自动化研究所
Recommended Citation
GB/T 7714
刘明哲,徐皑冬,于海斌. 半导体设备控制中SEMI标准模型研究[J]. 仪器仪表学报,2008,29(S):687-690.
APA 刘明哲,徐皑冬,&于海斌.(2008).半导体设备控制中SEMI标准模型研究.仪器仪表学报,29(S),687-690.
MLA 刘明哲,et al."半导体设备控制中SEMI标准模型研究".仪器仪表学报 29.S(2008):687-690.
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