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题名: Fuzzy predictive R2R control to CMP process
作者: Wang L(王亮) ; Hu JT(胡静涛)
作者部门: 工业信息学研究室
会议名称: 2011 IEEE International Conference on Computer Science and Automation Engineering, CSAE 2011
会议日期: June 10-12, 2011
会议地点: Shanghai, China
会议主办者: IEEE Beijing Section; Pudong New Area Association for Computer; Pudong New Area Science and Technology Development Fund; Tongji University; Xiamen University
会议录: Proceedings - 2011 IEEE International Conference on Computer Science and Automation Engineering, CSAE 2011
会议录出版者: IEEE Computer Society
会议录出版地: Piscataway, NJ
出版日期: 2011
页码: 6-10
收录类别: EI
ISBN号: 9781424487257
关键词: Chemical mechanical polishing ; Clustering algorithms ; Computer science ; Controllers ; Industrial applications ; Mathematical models ; Polishing ; Predictive control systems ; Semiconductor device manufacture ; Stripping (removal)
摘要: For chemical mechanical polishing (CMP) process characteristics of nonlinear, time-varying and not easily being in-situ measured, this paper proposes a CMP process fuzzy predictive run-to-run (R2R) controller named FPR2R. CMP T-S fuzzy predictive model is off-line and on-line identified by algorithms of fuzzy clustering and recursive least squares with forgetting factor, thus problem of constructing accurate mathematical model of complicated CMP is solved and error of modeling is reduced. Recipe is calculated by multivariable generalized predictive control (GPC) method, therefore it improves control precision. Simulation results illustrate that proposed CMP FPR2R controller is better than EWMA control scheme about performance, variation in various runs of products is reduced substantially, process drifts and shifts is suppressed significantly. Compared to EWMA, root mean squared error for material removal rate(MRR) is decreased.
产权排序: 1
内容类型: 会议论文
URI标识: http://ir.sia.cn/handle/173321/8358
Appears in Collections:工业信息学研究室_会议论文

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