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基于灰色模型的CMP过程免疫预测R2R控制 期刊论文
仪器仪表学报, 2012, 卷号: 33, 期号: 2, 页码: 306-314
Authors:  王亮;  胡静涛
View  |  Adobe PDF(720Kb)  |  Favorite  |  View/Download:592/147  |  Submit date:2012/10/24
化学机械研磨  灰色模型  克隆选择  预测控制  Run-to-run控制